Process For Making An Embossed Web

ABSTRACT

A process for making an embossed web. A precursor web is provided between a forming structure and a static pressure plenum. The forming structure has a plurality of discrete apertures or depressions. Pressure is provided by the static pressure plenum against the precursor web and the forming structure to force the precursor web into the apertures or depressions of forming structure to form the embossed web. The resulting embossed web has a plurality of discrete extended elements.

CROSS REFERENCE TO RELATED APPLICATION

This application is a continuation of application Ser. No. 12/721,989,filed Mar. 11, 2010, which claims the benefit of U.S. ProvisionalApplication No. 61/159,906, filed Mar. 13, 2009.

FIELD OF THE INVENTION

The invention relates to a process for making an embossed web comprisinga plurality of discrete extended elements.

BACKGROUND OF THE INVENTION

Web materials, such as thermoplastic films, have a variety of usesincluding component materials of absorbent articles (such as topsheetsand backsheets), packaging (such as flow wrap, shrink wrap, andpolybags), trash bags, food. wrap, dental floss, wipes, electroniccomponents, and the like. For many of these uses of web materials, itcan be beneficial for the web material to have a textured surface whichcan provide the surface of the web material with a desirable feel,visual impression, and/or audible impression.

Polymeric webs exhibiting a soft and silky tactile impression can bemade via a vacuum forming process or a hydroforming process. With atypical vacuum forming process, a precursor web is heated and placedover a forming structure. Then a vacuum forces the precursor web toconform to the texture of the forming structure. The resulting polymericweb has texture that can provide a soft and silky tactile impression,depending upon the texture of the forming structure and degree ofconformation. While a vacuum forming process can be suitable for makinga soft and silky polymeric web, a vacuum forming process is typicallylimited with respect to the amount of pressure capable of being exertedonto a precursor web. As a result, it is usually required to heat aprecursor film to significantly soften or melt the precursor film priorto placement on the forming structure in order to vacuum form theprecursor film to the forming structure. A vacuum forming process istherefore an inefficient process in terms of how fast the process can beperformed due to the heating step and the limited pressures generated bythe process.

With a typical hydroforming process, a precursor web is placed over aforming structure and high pressure and high temperature water jetsforce the precursor web to conform to the texture of the formingstructure. The resulting polymeric web can have texture that can providea soft and silky tactile impression, depending upon the texture of theforming structure. A hydroforming process, although capable of producingsoft and silky polymeric webs, is typically a costly and inefficientprocess involving the use of high pressure and high temperature waterjets and subsequent drying steps, including dewatering steps.

Embossing is a process that typically involves the act of mechanicallyworking a substrate to cause the substrate to conform under pressure tothe depths and contours of a pattern engraved or otherwise formed on anembossing roll. It is widely used in the production of consumer goods.Manufacturers use the embossing process to impart a texture or reliefpattern into products made of textiles, paper, synthetic materials,plastic materials, metals, and wood.

Embossing processes have been used to provide texture to polymericfilms. However, such embossing processes typically require extruding amolten resin onto a forming structure or heating a precursor web beforeplacement onto a forming structure and then embossing to produce anembossed web. The embossed web is then cooled, typically by cooling theembossing rolls or plates used to emboss the heated precursor web ormolten resin. The cooling step is often utilized to set the texture inthe embossed web. However, these heating and cooling steps addundesirable cost and inefficiency, as well as complexity, to theprocess. In addition, such embossing processes typically involverelatively large dwell times, which can result in slow, inefficientprocesses.

It is also typically difficult to impart relatively small scale textureto precursor webs using conventional embossing processes. Furthermore,typical embossing processes tend to produce embossed webs havingrelatively uniform thickness throughout the web.

For example, U.S. Pat. No. 5,972,280 discloses an embossing processutilizing a hot engraved surface of an embossing roll and staticpressure applied within a chamber to heat a web and deform it over thesurface of the embossed roll. This process uses elevated temperatures,which are typically above the softening temperature of the web, andrelatively low pressures of about 0.007 MPa to about 0.7 MPa. As aresult, the embossed pattern is formed as indentations disposed on onlya single surface of the web, without affecting the opposite surface ofthe web.

Despite the knowledge in the art, there remains a desire to develop amore efficient process for making embossed webs that have desirablefeel, visual impression, and/or audible impression, especially embossedwebs exhibiting thinning in desirable areas of the embossed web. Incertain aspects, a desired process is efficient with respect to theenergy and resources required by the process. In certain aspects, adesired process is capable of running at high speeds. In certainaspects, a desired process is capable of running at relatively lowtemperatures, such as ambient temperature.

SUMMARY OF THE INVENTION

In one embodiment, a process for making an embossed web includes feedinga precursor web between a static gas pressure plenum and a formingstructure having a plurality of discrete apertures, discretedepressions, or combinations thereof. The apertures or depressions ofthe forming structure have a depth that is at least three times athickness of the precursor web. The method further includes applyingpressure from the static gas pressure plenum against the precursor webopposite the forming structure thereby creating a differential pressureacross the precursor web sufficient to force the precursor web into theapertures of the forming structure, thereby forming the embossed webcomprising a plurality of discrete extended elements having openproximal ends.

Additional features of the invention may become apparent to thoseskilled in the art from a review of the following detailed description,taken in conjunction with the drawings, the examples, and the appendedclaims.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a top view of a forming structure in accordance with anembodiment of the disclosure;

FIG. 2 is a perspective view of a forming structure in accordance withan embodiment of the disclosure illustrating the distinction betweenapertures and depressions;

FIG. 3 is a perspective view of a portion of an embossed web formed by aprocess in accordance with an embodiment of the disclosure;

FIG. 4 is a cross-sectional view of a portion of an embossed web formedby a process in accordance with an embodiment of the disclosure;

FIG. 5 is a perspective view of a portion of an embossed web havingdiscrete extended elements with open distal ends formed by a process inaccordance with an embodiment of the disclosure;

FIG. 6 is a schematic representation of a process in accordance with anembodiment of the disclosure, illustrating a static gas pressure plenum;

FIG. 7 is a schematic representation of the aperture arrangement of aforming structure of use in a process in accordance with an embodimentof the disclosure;

FIG. 8 is a photomicrograph top view of an embossed web formed by aprocess in accordance with an embodiment of the disclosure; and

FIG. 9 is a photomicrograph perspective view of an embossed web formedby a process in accordance with an embodiment of the disclosure.

While the specification concludes with claims particularly pointing outand distinctly claiming the subject matter that is regarded as thepresent invention, it is believed that the invention will be more fullyunderstood from the following description taken in conjunction with theaccompanying drawings. Some of the figures may have been simplified bythe omission of selected elements for the purpose of more clearlyshowing other elements. Such omissions of elements in some figures arenot necessarily indicative of the presence or absence of particularelements in any of the exemplary embodiments, except as may beexplicitly delineated in the corresponding written description. None ofthe drawings are necessarily to scale.

DETAILED DESCRIPTION OF THE INVENTION

Disclosed herein is a process for forming an embossed web that overcomesone or more of the aforementioned shortcomings of the prior art.Specifically, embodiments of the process now make possible a moreefficient web embossing process. For example, embodiments of the processcan now make possible the ability to impart relatively small scaletexture to webs. Furthermore, embodiments of the process can now makepossible the ability to avoid the cumbersome heating and cooling stepsthat the prior art required. Still further, embodiments of the processdo not require the large dwell times required of prior art processes.Additionally, as compared to prior art static pressure processes,embodiments of the process can allow for the formation ofthree-dimensional discrete extended elements having open proximal endsand open or closed distal ends. In certain embodiments, the process canbe used to form macro-scale structures for use, for example, aspackaging materials such as bubble wrap.

The process generally includes feeding a precursor web 34 between astatic pressure plenum 36 and a forming structure 10. The formingstructure 10 includes a plurality of discrete apertures 12, discretedepressions 14, or combinations thereof. The apertures 12 or depressions14 have a depth that is at least substantially equal to the thickness ofthe precursor web 34, and preferably at least three times the thicknessof the precursor web 34. The process further includes applying apressure from the static pressure plenum 36 against the precursor web 34and the forming structure 10 sufficient to force portions of theprecursor web 34 into void volumes defined by the apertures 12 ordepressions 14, thereby forming the embossed web 16. The embossed web 16includes a plurality of discrete extended elements 22 having openproximal ends 30. These aspects of the process are described in furtherdetail below.

Forming Structure

Referring to FIGS. 1 and 2, a forming structure 10 useful in the processof the present disclosure includes a plurality of discrete apertures 12,discrete depressions 14, or a combination thereof. The forming structure10 can further include lands 13 completely surrounding the discreteapertures 12 or depressions 14. The discrete apertures 12 or depressions14 of the forming structure 10 are small in scale relative to typicalpatterns used on forming structures in conventional embossing processes.The process of the disclosure can produce embossed webs that includerelatively high aspect ratio extended elements with thinned distal ends24, even without heating the precursor web 34 and even at high speeds.

The forming structure 10 is sometimes referred to as a forming screen.FIG. 2 illustrates the distinction between apertures 12 and depressions14. As used herein, “apertures” refers to an opening in the formingstructure 10 that does not include a bottom surface limiting the depthof the opening. In contrast, as used herein, “depressions” refers to anopening in the forming structure 10 having a bottom surface limiting thedepth of the opening to be less than the thickness of the formingstructure 10. The bottom surface can be, for example, porous ornon-porous. In one embodiment, the forming structure has a means toallow the gas under the web to escape. For example, the depressions 14of the forming structure 10 can include vent holes in the bottom of thedepression. Optionally, a vacuum assist is provided to remove the gasunder the web and increase the pressure differential. The bottom surfacecan be flat, rounded, or sharp. The forming structure 10 can be a solidroll, or have a thickness of about 25 microns to about 5000 microns, orabout 100 microns to about 3000 microns. The depressions 14 can have adepth in a range of about 10 microns to about 500 microns, or about 25microns to about 5000 microns.

The perimeter of the apertures 12 or depressions 14 on the precursor web34 contacting surface of the forming structure 10 can have a straightedge or can have a radius of curvature as measured from the precursorweb 34 contacting surface of the forming structure 10 into the aperture12 or depression 14. The radius of curvature can be about 0 microns toabout 2000 microns, preferably about 0 microns to about 100 microns, andmore preferably about 2 microns to about 25 microns. In one embodiment,an angled taper, commonly known as a chamfer, is used. In one embodimenta combination of straight edges and radii are used.

The apertures 12 or depressions 14 have a diameter, which for agenerally cylindrical structure is the inside diameter. For non-uniformcross-sections, and/or non-cylindrical structures of apertures 12 ordepressions 14, diameter is measured as the average cross-sectionaldimension of apertures 12 or depressions 14 at the top surface of theforming structure. Each aperture or depression can have diameter ofabout 10 microns to about 5 mm. Other suitable diameters include, forexample, of about 50 microns to about 500 microns, about 65 microns toabout 300 microns, about 75 microns to about 200 microns, about 100microns to about 25,000 microns, about 500 microns to about 5000microns, or about 800 microns to about 2,500 microns, In certainembodiments, the apertures 12 or depressions 14 can have largerdiameters for forming macro-scale discrete extended elements. Forexample, the apertures 12 or depressions 14 can have a diameter up toabout 2.5 centimeters, up to about 2 centimeters, up to about 1.5centimeters, up to about 1 cm, up to about 0.5 centimeters, or up toabout 0.1 centimeters,

In one embodiment, the diameter of apertures 12 or depressions 14 isconstant or decreases with increasing depth. In another embodiment, thediameter of the apertures 12 or depressions 14 increases with increasingdepth. For example, the discrete apertures 12 or depressions 14 can havea first diameter at a first depth and a second diameter at a seconddepth deeper than the first depth. For example, the first diameter canbe larger than the second diameter. For example, the second diameter canbe larger than the first diameter.

The sidewalls of the discrete apertures 12 or depressions 11 can becompletely vertical or can be tapered. In one embodiment, the discreteapertures 12 or depressions 14 have tapered sidewalls. This can allowthe web to more easily separate from the forming structure 10 afterembossing. In one embodiment, the sidewalls will typically have a degreeof taper of about −50° to about 50°, about −30° to about 30°, 0° toabout 50°, about 2° to about 30°, or about 5° to about 25°.

The discrete apertures 12 or depressions 14 of the forming structure 10can have a variety of different cross-sectional shapes, such asgenerally columnar or non-columnar shapes, including circular, oval,hour-glass shaped, star shaped, polygonal, and the like, andcombinations thereof. Polygonal cross-sectional shapes include, but arenot limited to, rectangular, triangular, hexagonal, or trapezoidal. Inone embodiment, the discrete depressions 11 can have a lengthsubstantially equal to the length of the forming structure 10 so as toform grooves about substantially the entire length of the formingstructure 10. For example, when the forming structure 10 is in the formof a roll, the grooves can be formed about the entire circumference ofthe roll. The grooves can be substantially straight (e.g., consistentlyparallel to the edge of the roll) or can be wavy.

In general, the forming structure 10, for a given portion thereof, willinclude at least about 95 discrete apertures 12 or depressions 14 persquare centimeter, at least about 240 discrete apertures 12 ordepressions 14 per square centimeter, about 350 to about 10,000 discreteapertures 12 or depressions 14 per square centimeter, about 500 to about5,000 discrete apertures 12 or depressions 14 per square centimeter, orabout 700 to about 3,000 discrete apertures 12 or depressions 14 persquare centimeter. In certain embodiments, the apertures 12 ordepressions 14 can have a diameter greater than about 1 cm. Such largersized apertures 12 or depressions 14 can be useful in forming embossedwebs having larger-sized discrete extended elements, such as forexample, for packing material. In these embodiments, the formingstructure 10, for a given portion thereof, can include about 1 to about5 discrete apertures 12 or depressions 14 per 10 square centimeters.

The apertures 12 or depressions 14 can have an edge-to-edge spacingbetween two adjacent apertures 12 or depressions 14 of about 30 micronsto about 1000 microns, about 30 microns to about 800 microns, about 150microns to about 600 microns, or about 180 microns to about 500 microns.In certain embodiments, a portion (or area) of the forming structure 10can include area densities of discrete apertures 12 or depressions 14 asdescribed in the preceding paragraph, while other portions (or areas) ofthe forming structure 10 may include no discrete apertures 12 ordepressions 14. The areas of the forming structure 10 having no discreteapertures 12 or depressions 14 can be located in a different horizontalplane. In other embodiments, the discrete apertures 12 or depressions 14of the forming structure 10 can be located in different horizontalplanes of the forming structure 10. The regions having no discreteapertures 12 or depressions 14 and/or the regions having discreteapertures 12 or depressions 14 located in different horizontal planes ofthe forming structure 10 can be in the form of a specific pattern ordesign, such as a flower, bird, ribbon, wave, cartoon character, logo,and the like, so that the embossed web 16 will have a region that standsout visually from, and/or has a different hand feel when touchedrelative to, the remainder of the web. For example, the embossed web 16can include a non-embossed region that stands out visually from, and/orhas a different hand feel from embossed regions, U.S. Pat. No.5,158,819, the disclosure of which is incorporated herein by reference,provides suitable examples of forming structures for use in theseembodiments.

In one embodiment, a ratio of the average depth of the apertures 12 ordepressions 14 to the thickness of the precursor web 34 is at leastabout 1:1, at least about 2:1, at least about 3:1, at least about 4:1,at least about 5:1, or at least about 10:1. This ratio can be importantto ensure the precursor web 34 is sufficiently stretched so that itbecomes permanently deformed to create an embossed web 16, especially atdesirable process conditions and speed.

Forming structure 10 can be made of any material or materials that canbe formed to have apertures 12 or depressions 14 having the necessarydimensions to make an embossed web 16 and is dimensionally stable overprocess temperature and pressure ranges experienced by forming structure10.

In one embodiment, the forming structure 10 having the requiredrelatively small scale apertures 12 or depressions 14 can be made bylocal, selective removal of material, such as by chemical etching,mechanical etching, or by ablating by use of high-energy sources such aselectrical-discharge machines (EDM) or lasers, or by electron beam(e-beam), or by electrochemical machining (ECM). In one embodiment, theforming structure may be constructed by a photo etched laminate processgenerally in accordance with the teachings of U.S. Pat. No. 4,342,314.

In one method of making a suitable forming structure 10, a base materialsusceptible to laser modification is laser “etched” to selectivelyremove material to form apertures 12 or depressions 14. By “susceptibleto laser modification”, it is meant that the material can be selectivelyremoved by laser light in a controlled manner, recognizing that thewavelength of light used in the laser process, as well as the powerlevel, may need to be matched to the material (or vice-versa) foroptimum results. Laser etching can be achieved by known lasertechniques, selecting wavelength, power, and time parameters asnecessary to produce the desired protruded element dimensions. Currentlyknown materials susceptible to laser modification include thermoplasticssuch as polypropylene, acetal resins such as DELRIN® from DuPont,Wilmington Del., USA, thermosets such as crosslinked polyesters, orepoxies, or even metals such as aluminum, copper, brass, nickel,stainless steel, or alloys thereof. Optionally, thermoplastic andthermoset materials can be filled with particulate or fiber fillers toincrease compatibility with lasers of certain wavelengths of lightand/or to improve modulus or toughness to make more durable apertures 12or depressions 14. For example, certain polymers, such as PEEK, can belaser machined to higher resolution and at higher speeds by uniformlyfilling the polymer with sufficient amounts of hollow carbon nanotubefibers.

In one embodiment, a forming structure 10 can be laser machined in acontinuous process. For example, a polymeric material such as DELRIN®can be provided in a cylindrical form as a base material having acentral longitudinal axis, an outer surface, and an inner surface, theouter surface and inner surface defining a thickness of the basematerial. It can also be provided as a solid roll. A moveable lasersource can be directed generally orthogonal to the outer surface. Themoveable laser source can be moveable in a direction parallel to thecentral longitudinal axis of the base material. The cylindrical basematerial can be rotated about the central longitudinal axis while thelaser source machines, or etches, the outer surface of the base materialto remove selected portions of the base material in a pattern thatdefines a plurality of discrete apertures 12 or depressions 14.

The forming structure 10 can be in the form of a flat plate, a roll, abelt, an endless belt, a sleeve, or the like. In one preferredembodiment, the forming structure 10 is in the form of a roll. Inanother preferred embodiment, the forming structure 10 is in the form ofan endless belt. Endless belts can be formed in accordance with theteachings of U.S. Pat. Nos. 7,655,176, 6,010,598, 5,334,289, and4,529,480.

The forming structure 10 can optionally further include discreteprotruded elements. The discrete protruded elements can be sized andshaped and be formed as is described in co-pending U.S. ProvisionalPatent Application Ser. No. 61/159,906. If the forming structure 10further includes protruded elements, the precursor web 34 can be forcedonto the protruded elements of the forming structure 10, such thatdiscrete extended elements 22 can be formed in the precursor web 34extending from the surface of the precursor web 34 opposite the surfacefrom which the discrete extended elements 22 formed by the apertures 12or depressions 14 of the forming structure 10 are formed. As a result, atwo-sided embossed web 16 can be created, having different patterns ordimensions of extended elements on each side of the embossed web 16.Depending upon the pressure generated between the forming structure 10and compliant substrate, as well as the geometric shapes of theapertures 12 or depressions 14 and optional pillars or ridges of theforming structure 10, the discrete extended elements 22 of the embossedweb 16 can have closed or open distal ends 24.

Static Pressure Plenum

Referring to FIG. 6, a static pressure plenum 36 is utilized to providea force against precursor web 34 to force the precursor web 34 into theapertures 12 or depressions 14 of the forming structure 10. Preferably,the static pressure plenum 36 is a static gas pressure plenum. The gascan be air, nitrogen, carbon dioxide, and the like, or combinationsthereof.

The static gas pressure plenum 36 exerts a pressure on the precursor web34. The static gas pressure plenum 36 can include a hood 38 whichdefines a plenum 40 adjacent the precursor web 34. The hood 38 caninclude at least one high pressure gas inlet 42 allowing high pressuregas or other fluid to enter the hood 38 creating the static pressureconditions. Under static gas pressure conditions, there is no velocityand density impinging upon the unembossed precursor web 34 as with avelocity pressure source such as an air knife. Rather, a static high gaspressure is maintained in the hood 38 which creates a pressuredifferential across the precursor web, between the static pressureplenum 36 facing surface of the precursor web 34 and the formingstructure 10 facing surface of the precursor web 34. In one embodiment,the hood 38 can be wider than the precursor web, which can enhance theseal formed with the hood 38. The pressure differential is sufficient toforce the precursor web 34 into the apertures 12 or depressions 14 ofthe forming structure 10. The pressure differential can be enhanced, forexample, by applying a vacuum on the forming structure 10 facing surfaceof the precursor web 34.

Suitable static gas pressure plenums are also described in U.S.Provisional Patent Application Ser. No. ______, filed Mar. 11, 2010entitled “APPARATUS FOR EMBOSSING A WEB” (P&G Case 11.639P), and in U.S.Pat. No. 5,972,280.

Precursor Web

A precursor web 34 is converted into an embossed web 16 according to theprocess of the disclosure. Suitable precursor webs include materialsthat can be deformed by the pressure differential generated by thestatic pressure plenum 36 across the precursor web 34, such that theprecursor web 34 is forced into the apertures 12 or depressions 14 ofthe forming structure 10 to produce an embossed web 16.

The precursor web 34 typically includes synthetic material, metallicmaterial, biological material (in particular, animal-derived materials),or combinations thereof. The precursor web 34 can optionally includecellulosic material. In one embodiment, the precursor web 34 is free ofcellulosic material. Non-limiting examples of suitable precursor websinclude films, such as polymeric or thermoplastic films, foils, such asmetallic foils (e.g., aluminum, brass, copper, and the like), webscomprising sustainable polymers, foams, fibrous nonwoven webs comprisingsynthetic fibers (e.g. TYVEK®), collagen films, chitosan films, rayon,cellophane, and the like, Suitable precursor webs further includelaminates or blends of these materials.

If the precursor is a fibrous web, the fibrous web typically will have ahigh density such that it behaves similar to a film material. Oneexample of such a high density fibrous web is TYVEK®.

In one embodiment, the precursor web 34 is a polymeric film. Suitablepolymeric films include thermoplastic films such as polyethylene,polypropylene, polystyrene, polyethylene terephthalate (PET),polymethylmethacrylate (PMMA), polyvinyl alcohol (PVA), nylon,polytetrafluoroethylene (PTFE) (e.g., TEFLON), or combinations thereof.Suitable polymeric films can include blends or mixtures of polymers.

In certain embodiments, the precursor web 34 can be a web comprising asustainable polymer, such as polylactides, polyglycolides,polyhydroxyalkanoates, polysaccharides, polycaprolactones, and the like,or mixtures thereof.

The thickness of the precursor web 34 prior to embossing will typicallyrange from about 5 to about 300 microns, about 5 microns to about 150microns. about 5 microns to about 100 microns, or about 15 microns toabout 50 microns. Other suitable thicknesses includes about 1, 2, 3, 4,5, 6, 7, 8, 9, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 150, 200, 250,or 300 microns.

Precursor webs, such as polymeric webs, will typically have a glasstransition temperature of about −100° C. to about 120° C., or about −80°C. to about 100° C., or other suitable ranges. Precursor webs, such aspolymeric webs, can have a melting point of about 100° C. to about 350°C. For example, a precursor web 34 formed of LDPE or a blend of LDPE andLLDPE has a melting pointing of about 110° C., to about 122°. Aprecursor web 34 formed of polypropylene has a melting point of about165° C. A precursor web 34 formed of polyester has a melting point ofabout 255° C. A precursor web 34 formed of Nylon 6 has a melting pointof about 215° C., A precursor web 34 formed of PTFE has a melting pointof about 327° C.

In one embodiment, the process is carried out at a temperature less thanthe melting point of the precursor web. For example, the process can becarried out at 10° C. less than the melting point of the precursor web.In another embodiment, the process is carried out at a temperaturesubstantially equal to the melting point of the precursor web. In oneembodiment, the process is carried out at a temperature greater than theglass transition temperature of the precursor web.

Optionally, the precursor web 34 may be plasticized to make it lessbrittle prior to embossing in the process.

In one embodiment, the precursor web 34 is strain hardening. The strainhardening properties of the precursor web 34 can be desirable tofacilitate conformation of the precursor web 34 to the discreteprotruded elements of the forming structure 10. This can be preferredfor producing embossed webs wherein closed distal ends 24 of theextended elements 22 of the embossed web 16 are desired.

The precursor web 34 can be any material, such as a polymeric film,having sufficient material properties to be formed into an embossed web16 described herein by the embossing process of the disclosure, Theprecursor web 34 will typically have a yield point and the precursor web34 is preferably stretched beyond its yield, point to form an embossedweb 16. That is, the precursor web 34 should have sufficient yieldproperties such that the precursor web 34 can be strained withoutrupture to an extent to produce the desired discrete extended elements22 with closed distal ends 24 or, in the case of an embossed web 16comprising discrete extended elements 22 having open distal ends 24,rupture to form open distal ends 24, As disclosed below, processconditions such as temperature can be varied for a given polymer topermit it to stretch with or without rupture to form the embossed web 16having the desired discrete extended elements 22. In general, therefore,it has been found that preferred starting materials to be used as theprecursor web 34 for producing the embossed web 16 exhibit low yield andhigh-elongation characteristics. In addition, as discussed previously,the precursor webs preferably strain harden. Examples of films suitablefor use as the precursor web 34 include films comprising low densitypolyethylene (LDPE), linear low-density polyethylene (LLDPE), and blendsof linear low-density polyethylene and low density polyethylene(LLDPE/LDPE).

Precursor web 34 should also be sufficiently deformable and havesufficient ductility for use as a precursor web 34. The term“deformable” as used herein describes a material which, when stretchedbeyond its elastic limit, will substantially retain its newly formedconformation, as well as exhibit thinning at the distal ends 24 and/oralong the sidewalls of the discrete extended elements 22 of theresulting embossed web 16.

One material found suitable for use as a precursor web 34 is DOWLEX2045A polyethylene resin, available from The Dow Chemical Company,Midland, Mich., USA. A film of this material having a thickness of 20microns can have a tensile yield of at least 12 MPa; an ultimate tensileof at least 53 MPa; an ultimate elongation of at least 635%; and atensile modulus (2% Secant) of at least 210 MPa (each of the abovemeasures determined according to ASTM D 882). Other suitable precursorwebs include polyethylene film that is about 25 microns (1.0 mil) thickand has a basis weight of about 24 grams per square meter (“gsm”)available from available from RKW US, Inc. (Rome, Ga.) andpolyethylene/polypropylene film having a basis weight of about 14 gsmand a thickness of about 15 microns available from RKW US, Inc..

The precursor web 34 can be a laminate of two or more webs, and can be aco-extruded laminate. For example, precursor web 34 can include twolayers, and precursor web 34 can include three layers, wherein theinnermost layer is referred to as a core layer, and the two outermostlayers are referred to as skin layers. In one embodiment, the precursorweb 34 includes a three layer coextruded laminate having an overallthickness of about 25 microns (0.001 in.), with the core layer having athickness of about 18 microns (0.0007 in.); and each skin layer having athickness of about 3.5 microns (0.00015 in.). In one embodiment, thelayers can include polymers having different stress-strain and/orelastic properties.

The precursor web 34 can be made using conventional procedures forproducing multilayer films on conventional coextruded film-makingequipment. Where layers comprising blends are required, pellets of theabove described components can be first dry blended and then melt mixedin the extruder feeding that layer. Alternatively, if insufficientmixing occurs in the extruder, the pellets can be first dry blended andthen melt mixed in a pre-compounding extruder followed byrepelletization prior to film extrusion. Suitable methods for makingprecursor web 34 are disclosed in U.S. Pat. No. 5,520,875 and U.S. Pat.No. 6,228,462.

In general, the ability to form high area density (or low averagecenter-to-center spacing) discrete extended elements 22 on the embossedweb 16 can be limited by the thickness of precursor web 34.

In certain embodiments, the precursor web 34 can optionally furtherinclude a surfactant. If utilized, preferred surfactants include thosefrom non-ionic families such as: alcohol ethoxylates, alkylphenolethoxylates, carboxylic acid esters, glycerol esters, polyoxyethyleneesters of fatty acids, polyoxyethylene esters of aliphatic carboxylicacids related to abietic acid, anhydrosorbitol esters, ethoxylatedanhydrosorbitol esters, ethoxylated natural fats, oils, and waxes,glycol esters of fatty acids, carboxylic amides, diethanolaminecondensates, and polyalkyleneoxide block copolymers. Molecular weightsof surfactants selected can range from about 200 grams per mole to about10,000 grams per mole. Preferred surfactants have a molecular weight ofabout 300 to about 1,000 grams per mole.

If utilized, the surfactant level initially blended into precursor web34 can be as much as 10 percent by weight of the total precursor web 34.Surfactants in the preferred molecular weight range (300-1,000grams/mole) can be added at lower levels, generally at or below about 5weight percent of the total precursor web 34.

In certain embodiments, the precursor web 34 can also include titaniumdioxide in the polymer blend. Titanium dioxide can provide for greateropacity of the embossed web 16. Titanium dioxide can be added at up toabout 10 percent by weight of the precursor web 34, such as low densitypolyethylene.

Other additives, such as particulate material, e.g., carbon black, ironoxide, mica, calcium carbonate (CaCO₃), particulate skin treatments orprotectants, or odor-absorbing actives, e.g., zeolites, can optionallybe added in one or more layers of precursor web 34. In some embodiments,embossed webs comprising particulate matter, when used inskin-contacting applications, can permit actives to contact the skin ina very direct and efficient manner. Specifically, in some embodiments,formation of discrete extended elements 22 can expose particulate matterat or near the distal ends 24 thereof. Therefore, actives such as skincare agents can be localized at or near distal ends 24 of the discreteextended elements 22 to permit direct skin contact with such skin careagents when the embossed web 16 is used in skin contacting applications.

The average particle size of the particulate material, if utilized inthe precursor web 34, will typically be 0.2 to about 200 microns orabout 5 microns to about 100 microns. The use of certain particulatematerials, such as mica interference particles, can dramatically improvethe visual appearance of the embossed web 16.

The precursor web 34 can also optionally include colorants, such aspigment, lake, toner, dye, ink or other agent used to impart a color toa material, to improve the visual appearance of the embossed web 16.

Suitable pigments herein include inorganic pigments, pearlescentpigments, interference pigments, and the like. Non-limiting examples ofsuitable pigments include talc, mica, magnesium carbonate, calciumcarbonate, magnesium silicate, aluminum magnesium silicate, silica,titanium dioxide, zinc oxide, red iron oxide, yellow iron oxide, blackiron oxide, carbon black, ultramarine, polyethylene powder, methacrylatepowder, polystyrene powder, silk powder, crystalline cellulose, starch,titanated mica, iron oxide titanated mica, bismuth oxychloride, and thelike.

Suitable colored webs are described in co-pending U.S. application Ser.No. ______ filed Mar. 11, 2010 entitled “COLORED WEB MATERIAL COMPRISINGA PLURALITY OF DISCRETE EXTENDED ELEMENTS” (P&G Case 11634) and U.S.application Ser. No. ______, filed Mar. 11, 2010 entitled “WEB MATERIALEXHIBITING VIEWING-ANGLE DEPENDENT COLOR AND COMPRISING A PLURALITY OFDISCRETE EXTENDED ELEMENTS” (P&G Case 11635).

The precursor web 34 can also optionally include fillers, plasticizers,and the like.

Embossed Web

The precursor web 34 is processed according to the process of thedisclosure to form an embossed web 16 that can have various desiredstructural features and properties such as desired soft hand feel and anaesthetically pleasing visual appearance. The precursor web 34 ispositioned between the forming structure 10 and the static pressureplenum 36 provided to conform the precursor web 34 to the discreteapertures 12 or depressions 14 of the forming structure 10. Referring toFIG. 3, an embossed web 16 having discrete extended elements 22 isthereby produced. As shown in FIG. 4, the discrete extended elements 22have open proximal ends 30 and open (as shown in FIG. 5) or closeddistal ends 24 (as shown in FIGS. 3 and 4).

In one embodiment, the embossed web 16 resulting from the processdescribed herein can have a structure 10 similar to that described indetail in U.S. Pat. Nos. 7,402,723 or 7,521,588.

The three-dimensional embossed web 16 is produced from a precursor web34, which can be a single layer of web material or a multilayercoextruded or laminate web material as described hereinbefore. Laminatefilm materials may be coextruded, as is known in the art for makinglaminate films, including films comprising skin layers. In theembodiment illustrate in FIG. 3, the precursor web 34 is a two layerlaminate film comprising a first layer 18 and a second layer 20.

The discrete extended elements 22 are formed as protruded extensions ofthe web, generally on a first surface 26 thereof. The number, size, anddistribution of discrete extended elements 22 on the embossed web 16 canbe predetermined based on desired soft feel and visual effects. Forapplications such as a topsheet, backsheet or release paper wrapper indisposable absorbent articles, or packaging, it can be desired that thediscrete extended elements 22 protrude only from one surface of embossedweb 16. Therefore, when the embossed web 16 is used as a topsheet in adisposable absorbent article, the embossed web 16 can be oriented suchthat the discrete extended elements 22 are skin contacting for superiorsoftness impression. Moreover, having discrete extended elements 22 withclosed distal ends 24 can result in reduced rewet, i.e., reduced amountsof fluid being re-introduced to the surface of the topsheet after havingbeen first passed through apertures 12 of the topsheet to underlyingabsorbent layers.

Referring to FIG. 4, the discrete extended elements 22 can be describedas protruding from a first surface 28 of the embossed web 16. As such,the discrete extended elements 22 can be described as being integralwith precursor web 34, and formed by permanent local plastic deformationof the precursor web 34. The discrete extended elements 22 can bedescribed as having a side wall(s) 28 defining an open proximal portion30 and a closed or open distal end 24. The discrete extended elements 22each have a height h measured from a minimum amplitude A_(min) betweenadjacent extended elements to a maximum amplitude A_(max) at the closedor open distal end 24. The discrete extended elements 22 have a diameterd, which for a generally cylindrical structure 10 is the outsidediameter at a lateral cross-section. By “lateral” is meant generallyparallel to the plane of the first surface 26. For generally columnardiscrete extended elements 22 having non-uniform lateral cross-sections,and/or non-cylindrical structures of discrete extended elements 22,diameter d is measured as the average lateral cross-sectional dimensionat ½ the height h of the discrete extended element. Thus, for eachdiscrete extended element, an aspect ratio, defined as h/d, can bedetermined. The discrete extended element can have an aspect ratio hidof at least about 0.2, at least about 0.3, at least about 0.5, at leastabout 0.75, at least about 1, at least about 1.5, at least about 2, atleast about 2.5, or at least about 3. The discrete extended elements 22will typically have a height h of at least about 30 microns, at leastabout 50 microns, at least about 65, at least about 80 microns, at leastabout 100 microns, at least about 120 microns, at least about 1.50microns, or at least about 200 microns, The extended elements willtypically be at least the same height as the thickness of the precursorweb, or at least 2 times the thickness of the precursor web, orpreferably at least 3 times the thickness of the precursor web. Thediscrete extended elements 22 will typically have a diameter d of about50 microns to about 5,000 microns, about 50 microns to about 3,000microns, about 50 microns to about 500 microns, about 65 microns toabout 300 microns, or about 75 microns to about 200 microns. In certainembodiments, the discrete extended elements 22 can have larger diametersd up to about 2.5 centimeters, up to about 2 centimeters, up to about1.5 centimeters, up to about cm, up to about 0.5 centimeters, or up toabout 0.1 centimeters.

For discrete extended elements 22 that have generally non-columnar orirregular shapes, a diameter of the discrete extended element can bedefined as two times the radius of gyration of the discrete extendedelement at ½ height.

For discrete extended elements that have shapes, such as ridges, thatextend lengthwise across the entire web material such that the extendedelements have a portion of the sidewalls of the extended elements thatare open, a diameter of a discrete extended element can be defined asthe average minimal width between two opposing sidewalls of the extendedelement at ½ height.

In general, because the actual height h of any individual discreteextended element can be difficult to determine, and because the actualheight may vary, an average height h_(avg) of a plurality of discreteextended elements 22 can be determined by determining an average minimumamplitude A_(min) and an average maximum amplitude A_(max) over apredetermined area of the embossed web 16. Such average height hp_(avg)will typically fall within the ranges of heights described above.Likewise, for varying cross-sectional dimensions, an average diameterd_(avg) can be determined for a plurality of discrete extended elements22. Such average diameter d_(avg) will typically fall within the rangesof diameters described above. Such amplitude and other dimensionalmeasurements can be made by any method known in the art, such as bycomputer aided scanning microscopy and data processing. Therefore, anaverage aspect ratio AR_(avg) of the discrete extended elements 22 for apredetermined portion of the embossed web 16 can be expressed ash_(avg)/d_(avg).

In one embodiment, the diameter of a discrete extended element isconstant or decreases with increasing amplitude (amplitude increases toa maximum at closed or open distal end 24). The diameter, or averagelateral cross-sectional dimension, of the discrete extended elements 22can be a maximum at proximal portion and the lateral cross-sectionaldimension steadily decreases to distal end. This structure 10 isbelieved to be desirable to help ensure the embossed web 16 can bereadily removed from the forming structure 10. In another embodiment,the diameter of the discrete extended elements 22 increases withincreasing amplitude. For example, the discrete extended elements 22 canhave a mushroom shape.

Thinning of the precursor web 34 can occur due to the relatively deepdrawing required to form high aspect ratio discrete extended elements22. For example, thinning can be observed at the closed or open distalends 24 and/or along the sidewalls. By “observed” is meant that thethinning is distinct when viewed in magnified cross-section. Suchthinning can be beneficial as the thinned portions offer littleresistance to compression or shear when touched. For example, when aperson touches the embossed web 16 on the side exhibiting discreteextended elements 22, the fingertips of the person first contact theclosed or open distal ends 24 of the discrete extended elements 22. Dueto the high aspect ratio of the discrete extended elements 22, and thewall thinning of the precursor web 34 at the distal ends 24 and/or alongthe sidewalls, the discrete extended elements 22 offer little resistanceto the compression or shear imposed on the embossed web 16 by theperson's fingers. This lack of resistance is registered as a feeling ofsoftness, much like the feeling of a velour fabric.

Thinning of the precursor web 34 at the closed or open distal ends 24and/or along the sidewalls can be measured relative to the thickness ofthe precursor web 34 or relative to the thickness of the land area thatcompletely surrounds the discrete extended elements 22 of the embossedweb 16. The precursor web 34 will typically exhibit thinning of at leastabout 25%, at least about 50%, or at least about 75% relative to thethickness of the precursor web 34. The precursor web 34 will typicallyexhibit thinning of at least about 25%, at least about 50%, or at leastabout 75%, at least about 85% relative to the thickness of the land areasurrounding the discrete extended elements 22 of the embossed web 16.

It should be noted that a fluid impermeable web having only the discreteextended elements 22 as disclosed herein, and not having macroscopicapertures 12 or discrete extended elements 22 having open distal ends24, can offer softness for any application in which fluid permeabilityis not required. Thus, in one embodiment, the process produces anembossed web 16 exhibiting a soft and silky tactile impression on atleast one surface thereof, the silky feeling surface of the embossed web16 exhibiting a pattern of discrete extended elements 22, each of thediscrete extended elements 22 being a protruded extension of the websurface and having aside wall defining an open proximal portion 30 and aclosed or open distal end 24, the discrete extended elements 22 having amaximum lateral cross-sectional dimension at or near the open proximalportion 30.

The embossed web 16 can also exhibit improved sound effects. Forexample, when handled or manually manipulated, the embossed web 16creates less sound as compared to the precursor web 34.

The “area density” of the discrete extended elements 22, which is thenumber of discrete extended elements 22 per unit area of first surface26, can be optimized and the embossed web 16 will typically includeabout 4 to about 10,000, about 95 to about 10,000, about 240 to about10,000, about 350 to about 10,000, about 500 to about 5,000, or about700 to about 3,000 discrete extended elements 22 per square centimeter.In general, the center-to-center spacing can be optimized for adequatetactile impression, while at the same time minimizing entrapment ofmaterials, such as fluids, between discrete extended elements 22. Thecenter-to-center spacing between adjacent discrete extended elements 22can be about 100 microns to about 1,000 microns, about 30 microns toabout 800 microns, about 150 microns to about 600 microns, or about 180microns to about 500 microns.

When the embossed web 16 is utilized as a topsheet for disposableabsorbent articles, the embossed web 16 can further includemacroapertures that allow fluid to flow through the embossed web 16.

Process for Making Embossed Web

Referring again to FIG. 6, the process for forming an embossed web 16includes feeding the precursor web 34 between the static pressure plenum36 and the forming structure 10 and applying a gas pressure from thestatic pressure plenum 36 against the precursor web 34 and the formingstructure 10 sufficient to force portions of the precursor web 34 intovoid volumes defined by the apertures 12 or depressions 14 of theforming structure 10 to thereby form an embossed web 16 having discreteextended elements 22. The conformation of the precursor web 34 to theforming structure 10 can be partial conformation, substantialconformation, or complete conformation, depending upon the pressuregenerated and the topography of the forming structure 10. While notbeing bound by theory, it is believed that open distal ends 24 can beformed by locally rupturing the precursor web 34 while forcing theprecursor web 34 into the apertures 12 or depressions 14 of the formingstructure 10.

To obtain permanent deformation of the precursor web 34 to form theembossed web 16, the applied pressure is generally sufficient to stretchthe precursor beyond its yield point.

The process can be a batch process or a continuous process. A batchprocess can involve providing individual sheets of precursor web 34material placed between the forming structure 10 and static pressureplenum 36.

A continuous process can involve providing a roll of precursor web 34material that is unwound and fed between the forming structure 10 andstatic pressure plenum 36. The forming structure 10 can be, for example,in the form of a roll. As the precursor web 34 passes between theforming structure 10 roll and the static pressure plenum 36, an embossedweb 16 is formed.

The process can have relatively short dwell times. As used herein, theterm “dwell time” refers to the amount of time pressure is applied to agiven portion of the precursor web 34, usually the amount of time agiven portion of the precursor web 34 spends positioned between theforming structure 10 and static pressure plenum 36. The pressure istypically applied to the precursor web 34 for a dwell time of less thanabout 5 seconds, less than about 1 second, less than about 0.5 second,less than about 0.1 second, less than about 0.01 second, or less thanabout 0.005 second. For example, the dwell time can be about 0.5milliseconds to about 50 milliseconds. Even with such relatively shortdwell times, embossed webs can be produced with desirable structuralfeatures described herein. As a result, the process of the disclosureenables high speed production of embossed webs.

The precursor web 34 can be fed between the forming structure 10 and thestatic pressure plenum 36 at a rate of at least about 0.01 meters persecond, at least about 1 meter per second, at least about 5 meters persecond, or at least about 10 meters per second. Other suitable ratesinclude, for example, at least about 0.01, 0.05, 0.1, 0.5, 1, 2, 3, 4,5, 6, 7, 8, 9, or 10 meters per second.

Depending upon factors such as the shape of the apertures 12 ordepressions 14 on the forming structure 10 and the pressure applied, thedistal ends 24 of the extended elements of the embossed web 16 producedby the process of the disclosure can be either closed or open.

The process can be carried out at ambient temperature, meaning that noheat is intentionally applied to the forming structure 10 and/orprecursor web 34. It should be recognized, however, that heat can begenerated due to the pressure between the forming structure 10 and thestatic pressure plenum 36, especially in a continuous process. As aresult, the forming structure 10 and/or the compliant substrate may becooled in order to maintain the process conditions at the desiredtemperature, such as ambient temperature.

The process can also be carried out with the precursor web 31 having anelevated temperature. For example, the temperature of the precursor web34 can be less than the melting point of the precursor web 34. Forexample, the temperature of the precursor web 34 can be at least about10° C. below the melting point of the precursor web 34. The precursorweb 34, especially a precursor web 34 including polyethylenes, can havea temperature during the process of about 10° C. to about 200° C., about10° C. to about 120° C., about 20° C. to about 110° C., about 10° C. toabout 80° C., or about 10° C. to about 40° C. The precursor web 34 canbe heated during the process by heating the precursor web 34, using aheated fluid pressure source for the static pressure plenum 36, and/orby heating the forming structure 10. For example, a heated gas can beused as the pressure source for the static pressure plenum 36.

In one embodiment, the precursor web is not heated before being providedbetween the forming structure and the compliant substrate. In anotherembodiment, the precursor web, the forming structure and the compliantsubstrate are not heated before providing the precursor web between theforming structure and the compliant substrate.

In general, the process of the present invention can be carried out at atemperature of from about 10° C. to about 200° C., from about 10° C. toabout 120° C., from about 10° C. to about 80° C., or from about 10° C.to about 40° C. The temperature can be measured by, for example, anon-contact thermometer, such as an infrared thermometer or a laserthermometer, measuring the temperature at the nip between the compliantsubstrate and forming structure. The temperature can also be determinedusing temperature sensitive material such as Thermolabel available fromPaper Thermometer Company.

An average pressure is provided by the static pressure plenum 36. Theaverage pressure is sufficient to force the precursor web 34, which ispositioned between the forming structure 10 and static pressure plenum36, into the discrete apertures 12 or depressions 14 of the formingstructure 10 to form an embossed web 16. In general, the averagepressure provided between the forming structure 10 and static pressureplenum 36 is about 0.1 MPa to about 25 MPa, about 1 MPa to about 20 MPa,about 0.5 MPa to about 10 MPa, about 10 MPa to about 25 MPa, or about0.5 MPa to about 5 MPa.

The process can optionally further include applying a slip agent to theprecursor web 34 and/or the forming structure 10 before the precursorweb 34 is provided between the forming structure 10 and the staticpressure plenum 36. This can be beneficial, especially in a continuousprocess, to reduce friction between the precursor web 34 and the formingstructure 10. Non-limiting examples of suitable slip agents includesilicone, talc, lubricating oils, and the like.

The process can optionally be combined with other processes to furthermanipulate the embossed web 16. In one embodiment, such additionalprocesses can be combined with the process on the same processmanufacturing line to produce, for example, absorbent articles. In oneembodiment, the process is combined with a process that can impartmacroapertures in the embossed web 16, such as the process described inUS 2006/0087053 A1 or US 2005/0064136 A1. Such a process combination canproduce a macroapertured embossed web 16 that can be suitable for use asa topsheet in an absorbent article. Such a macroapertured embossed web16 can be subsequently converted into an absorbent article by combiningit with other absorbent article components, such as absorbent cores,backsheets, and the like, preferably on the same process manufacturingline.

In addition to the processes described hereinbefore, alternativeprocesses for making embossed webs are contemplated. The process canfurther include applying pressure from a second pressure source. Thesecond pressure source can be selected from the group consisting of astatic liquid pressure plenum, a static gas pressure plenum, a velocitygas pressure source, such as an air knife, a velocity liquid pressuresource, such as is used in conventional hydroforming process, and acompliant substrate. U.S. Patent Application No. 61/159,906, discloses asuitable compliant substrate for use in the process of the presentdisclosure. The pressures exerted on the precursor web 34 by the secondpressure source will typically be similar to those pressures exerted onthe precursor web 34 by the static pressure plenum 36 describedhereinbefore. The second pressure source can apply a pressure againstthe precursor web before or after the static pressure plenum. Forexample, the process can include using multiple static pressure plenums.In one embodiment, at least two static pressure plenums are provided andpressure is applied on a first portion of the precursor web 34 betweenthe forming structure 10 and a first static pressure plenum. Pressurecan then be applied on the first portion of the precursor web 34 betweenthe forming structure 10 and a second static pressure plenum. This canfurther force the portion of the precursor web registered to the sameapertures or depressions of the forming structure. This can allow forenhancement of the discrete extended elements 22 formed by the process.

Uses of Embossed Web

The embossed webs can be utilized in a number of different ways,including as component materials of absorbent articles (such astopsheets, backsheets or release paper wrappers), packaging (such asflow wrap, shrink wrap, or polybags), trash bags, food wrap, dentalfloss, wipes, electronic components, wall paper, clothing, aprons,window coverings, placemats, book covers, and the like.

EXAMPLES

The following are non-limiting examples of a process for making anembossed web of the present invention.

Example 1

Embossed webs are produced using a static gas pressure plenum and aforming structure 10 having about 1550 apertures per square centimeter(about 10,000 apertures per square inch, 100 mesh metallic aperturedplate). The forming structure is made of metal and has a thickness ofabout 1 mm. The apertures have a circular cross-section with a diameterof about 180 microns and a center-to-center spacing of about 250microns. The sidewalls of the apertures are straight. As illustrated inFIG. 7, the apertures are offset relative to adjacent apertures.

The precursor web 34 utilized is a polyethylene film obtained from RKWUS, Inc. that is about 15 microns thick and has a basis weight of 14.2grams per square meter (“gsm”).

The embossing process is performed using a high speed research presswith the forming structure preheated to a temperature of about 110° C.The high speed research press is described in detail in U.S. PatentPublication No. 2009/0120308, and is designed to simulate a continuousproduction line process for embossing the precursor web 34. The pressincludes a manifold plate having a 25 mm×25 mm opening surrounded byrubber (40A durometer Neoprene), which is connected to a high pressuresource to deliver the pressure for the static gas pressure plenum. Theforming structure engages the rubber of the manifold plate to acompression distance of about 1.8 mm, sealing the precursor web betweenthe forming structure and the rubber. A pressure differential is therebycreated across the precursor web by the static gas pressure plenum, withatmospheric pressure being present on the forming structure facing sideof the precursor web and a pressure of about 2 MPa on the opposing sideof the precursor web from the static gas pressure plenum. The press isoperated to simulate forming structure roll diameters of 205 mm. Theprecursor web 34 is fed between the forming structure 10 and the staticgas pressure plenum at a simulated rate of about 2.74 m/sec. The dwelltime is about 0.19 seconds. The resulting embossed web includes discreteextended elements having an average height of about 68 microns andclosed distal ends (as shown in FIG. 8).

Example 2

Embossed webs are produced using a static gas pressure plenum and aforming structure 10 having about 1550 apertures per square centimeter(about 10,000 apertures per square inch, 100 mesh metallic aperturedplate). The forming structure is made of metal and has a thickness ofabout 1 mm. The apertures have a circular cross-section with a diameterof about 180 microns and a center-to-center spacing of about 250microns. The sidewalls of the apertures are straight. As illustrated inFIG. 7, the apertures are offset relative to adjacent apertures.

The precursor web 34 utilized is a polyethylene film obtained from RKWUS, Inc. that is about 15 microns thick and has a basis weight of 14.2grams per square meter (“gsm”).

The embossing process is performed using a high speed research press, asdescribed in Example 1. The press is operated to simulate a formingstructure roll diameter of 205 mm. The forming structure is preheated toa temperature of about 90° C. The precursor web 34 is fed between theforming structure 10 and the static gas pressure plenum 36 at asimulated rate of 2.74 m/sec. The static pressure plenum generates apressure of about 2 MPa. The dwell time is about 0.19 seconds. Theembossed web 16 includes discrete extended elements having a height ofabout 57 microns and closed distal ends (as shown in FIG. 9).

The dimensions and values disclosed herein are not to be understood asbeing strictly limited to the exact numerical values recited. Instead,unless otherwise specified, each such dimension is intended to mean boththe recited value and a functionally equivalent range surrounding thatvalue. For example, a dimension disclosed as “40 mm” is intended to mean“about 40 mm.”

When a technical feature is disclosed herein in relation to oneembodiment, this feature can be combined with any other feature(s)disclosed in other embodiment(s) or claim(s), unless stated otherwise.

All documents cited in the Detailed Description of the Invention are, inrelevant part, incorporated herein by reference; the citation of anydocument is not to be construed as an admission that it is prior artwith respect to the present invention. To the extent that any meaning ordefinition of a term in this document conflicts with any meaning ordefinition of the same term in a document incorporated by reference, themeaning or definition assigned to that term in this document shallgovern.

While particular embodiments of the present invention have beenillustrated and described, it would be obvious to those skilled in theart that various other changes and modifications can be made withoutdeparting from the spirit and scope of the invention. It is thereforeintended to cover in the appended claims all such changes andmodifications that are within the scope of this invention.

What is claimed is:
 1. A process for making an embossed film web,comprising: feeding a precursor film web between a static gas pressureplenum and a forming structure comprising a plurality of discreteapertures, discrete depressions, or combinations thereof, the aperturesor depressions having a depth of at least substantially equal to athickness of the precursor web, wherein the static gas pressure plenumcreates static pressure conditions; applying a vacuum on a formingstructure facing surface of the precursor film web; and applying staticpressure from the static gas pressure plenum against the precursor webopposite the forming structure creating a pressure differential acrossthe precursor web sufficient to force the precursor web into theapertures or depressions of the forming structure, thereby forming theembossed web comprising a plurality of discrete extended elements havingopen proximal ends.
 2. A process of claim 1, further comprising applyinga pressure from a second pressure source against the precursor webopposite the forming structure sufficient to force portions of theprecursor web into void volumes defined by the apertures or depressions.3. The process of claim 2, wherein pressure is applied from the secondpressure source before pressure is applied from the static gas pressureplenum.
 4. The process of claim 2, wherein pressure is applied from thesecond pressure source after pressure is applied from the static gaspressure plenum.
 5. The process of claim 2, wherein the second pressuresource is selected from the group consisting of a static liquid pressureplenum, a static gas pressure plenum, a velocity gas pressure source, avelocity liquid pressure source, and a compliant substrate.